Two project teams, MFX (Matter from Graphics) and Pixel, joint undertakings involving Inria and Loria based in Nancy, have developed an innovative software for the 3D printing of curved surfaces. In order to avoid “the staircase effect”, the new algorithm CurviSlicer divides the shape of the part to be printed into curved slices in such a way that the deposition follows the surfaces naturally. This makes it possible to perform deposition along smooth curved surfaces using a conventional fused filament 3D printer. Their work will be unveiled at the international conference SIGGRAPH on 31st July 2019.
Doing a PhD at Inria will open you the doors to academic research world-wide, whether you are francophone or not. Aravind Sukumaran-Rajam, a former PhD student at Inria’s centre “Nancy-Grand Est” is now a Senior research associate at the Ohio State University (OSU), Columbus, and will become Assistant professor at the Washington State University (WSU) as of August 2019.
He tells us about his inspiring time as an anglophone within an Inria research team in Strasbourg, France, and how it helped him build up his career.
3D printing allows scientists to create metamaterials, i.e. materials whose properties can be configured and graded within the same part. When it comes to using these materials in an industrial context, the possibilities are endless. A collaborative project led by Jonàs Martínez, researcher within the MFX team, a joint undertaking involving Nancy-Grand Est and Loria, resulted in the development of an algorithm capable of generating materials with elastic properties that can be adjusted to suit requirements. The work, which was based around the repetition of patterns defined from star shaped distances, the parameters of which determine the final properties of the material, will be unveiled at the international conference SIGGRAPH 2019.
How can we digitally recreate the unevenness of tree bark, sand or roughcasting in such a way that they appear natural? The answer comes from the MFX (Inria Nancy-Grand Est and Loria) and Maverick (Inria Grenoble) project teams, who worked together to develop an innovative algorithm capable of generating such patterns on surfaces. An upgrade on the previous standard in the field (Gabor Noise), Procedural Phasor Noise is set to be unveiled at the international conference SIGGRAPH 2019, and will enable users to generate complex patterns with previously unachievable levels of control. Designed for 3D printing, it will also make it easier to manufacture composite materials whose physical properties may vary depending on the direction.
Selected by the national jury of the i-Lab innovation competition organised by Bpifrance and the French Ministry of Higher Education, Research and Innovation, GeO2 technology is the work of a team of researchers from Inria Nancy-Grand Est. The project will lead to the creation of a start-up within the next 12 months. Using digital modelling, it aims to enhance the use of natural underground reservoirs, not only for "new" users of the underground environment as part of the transition to a green economy, but also for existing fossil industries. Here GeO2 introduces itself for its pre-release.
Nominated to the national jury of the i-Lab contest, organised by Bpifrance and the Ministry of Higher Education, Research and Innovation, Dynalips was created in 2015 within the Multispeech project team, jointly supported by Inria and the Loria. This lipsync technology is soon to be marketed by its own start-up. We will be finding more about it today.
Having moved to France in 2014, Jonàs Martinez Bayona, a young researcher at Inria Nancy - Grand Est, has just been named scientific correspondent for Europe. His role? To find out as much as he can about the various calls for projects launched at European level, to identify potential partners and to liaise with all teams from Inria Nancy - Grand Est.
We met up with Lucca Hirschi, 29, who joined Inria as a research fellow on 1st January 2019 as part of the Pesto team, a joint undertaking involving Inria and Loria.
Three researchers from the RESIST research team, based at Inria in Nancy and at the Loria laboratory, were honoured during the 16th International IFIP/IEEE Symposium, IM 2019. The symposium was dedicated to integrated network management, and took place in Washington DC between the 8th to 12th April.
- Tens of free educational resources on code and computational thinking ‘à la carte’, to use and reuse...
- Training paths: training designed by experts in the digital sciences you can follow at your own pace
- Meetings with other participants in order to discuss, share and experiment – close to where you live
- and testimonials!
Her wiki webpage
Marie in five dates:
- 1994: Bac C (mathematics and science baccalaureate), computer science option, followed by preparatory class
- 1996: Graduate school ENS Cachan, mathematics and computer science
- 2003: PhD in computer science
- 2004: Lecturer at Créteil
- 2011: Arrived to Nancy
Steve Kremer: Following studies in computer science in Belgium, he spent a post-doctoral year at the University of Birmingham in England. On his return he joined the Inria Saclay centre, within the SECSI team, which works on information systems security, before joining the Inria Nancy - Grand Est research centre in 2011.
Vincent Cheval: Following a PhD at ENS Cachan, he studied post-doctoral degrees at the University of Birmingham and at Inria Nancy. He then became a lecturer at the University of Kent, in England, before being recruited by Inria in 2015 as a researcher.
Itsaka Rakotonirina: He works on information security. Following a master's in fundamental computer science at ENS Cachan, he did his end-of-studies internship with Steve, which made him want to continue with a PhD at the Inria Nancy - Grand Est research centre.